前驱体流速对碳化硅化学气相沉积不均匀性的影响
孙硕伟,许太源.前驱体流速对碳化硅化学气相沉积不均匀性的影响[J].宁波大学学报(理工版),2026,39(3):104-112.DOI:10.20098/j.cnki.1001-5132.2025.1006
Sun Shuowei,Xu Taiyuan.Influence of precursor flow rate on chemical vapor deposition unevenness of silicon carbide[J].Journal of Ningbo University(Natural Science & Engineering Edition),2026,39(3):104-112.DOI:10.20098/j.cnki.1001-5132.2025.1006
| Title: | Influence of precursor flow rate on chemical vapor deposition unevenness of silicon carbide |
| 作者: | 孙硕伟, 许太源 |
| Author(s): | Sun Shuowei, Xu Taiyuan |
| 关键词: | 化学气相沉积; 三氯甲基硅烷; 碳化硅; 涡旋 |
| Keywords: | CVD; MTS; silicon carbide; vortex |
| 分类号: | TQ050.1 |
| DOI: | 10.20098/j.cnki.1001-5132.2025.1006 |
| 文献标识码: | A |
| 摘要: | 针对垂直式化学气相沉积反应炉沉积过程对炉内气体流动高度依赖、工艺参数影响沉积均匀性与效率的问题，采用多物理场耦合方法分析进气口流速对气体流场、前驱体浓度分布及碳化硅沉积速率的影响，揭示流速调控下流场结构演变与沉积行为的耦合，为工艺优化与质量提升提供依据。结果表明：前驱体流速由1m/s增至2m/s时，雷诺数由1200升至2400，剪切层失稳使流动由层流转入过渡区；动量比增大并超过氢气主导的临界值，诱发惯性失稳形成非对称涡旋。1m/s时以层流为主，三氯甲基硅烷沿壁面螺旋下行并向外径聚集，形成以轴向为主的浓度梯度；1.5m/s时氢气主导，气相相互作用形成稳定涡对，浓度分布更均匀、沉积速率波动较小；2m/s时非对称涡旋导致浓度梯度起伏增强，沉积速率在涡核下游出现双峰分布。 |
| Abstract: | To address the strong dependence of deposition in a vertical chemical vapor deposition reactor on in-furnace gas flow and the consequent impacts of process parameters on the uniformity and efficiency of deposition, this study employs a multiphysics coupled framework to systematically quantify how inlet velocity shapes the flow field, precursor concentration, and SiC deposition rate. Also, it attempts to reveal a tight coupling between flow-structure evolution under velocity control and deposition behavior, providing guidance for process optimization and improved film quality. The results demonstrate that, increasing precursor velocity from 1m/s to 2m/s raises the Reynolds number from 1200 to 2400, with shear-layer destabilization driving the flow from laminar toward transitional; the momentum ratio increases and exceeds the critical value for hydrogen dominance, triggering inertial instability and asymmetric vortices. At 1m/s, the flow remains predominantly laminar and methyltrichlorosilane spirals downward along the wall, accumulating toward larger radii and establishing a primarily axial concentration gradient. At 1.5m/s, H2 dominates and a stable vortex pair forms, yielding a more uniform concentration field and reduced deposition-rate fluctuations. At 2m/s, asymmetric vortices intensify concentration-gradient oscillations and produce a downstream bimodal deposition-rate profile beneath the vortex core. |
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| 备注/Memo: | 收稿日期：2025-10-15 宁波大学学报（理工版）网址：http://journallg.nbu.edu.cn/ 第一作者：孙硕伟，硕士研究生，主要研究方向为多物理场耦合。E-mail: sureway2021@163.com 宁波大学学报（理工版）网址：http://journallg.nbu.edu.cn/ |
